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Semiconductor Etching Processes Key Components Silicon Parts / Gasket



It is the main component of the vacuum chamber in the semiconductor etching process LAM / TEL / AMEC equipment.
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Product Name 

Silicon Parts & Gasket。

Model 

LAM FLEX series ELECTRODE / C SHROUD RING / FOUCUS RING, TEL VIGUS ELECTRODE, etc.

Application Direction

Mainly used parts for vacuum chamber in LAM / TEL / AMEC equipment for semiconductor etching process.

Product Features

The main cost of silicon parts is the same as that of wafers, and the vacuum chamber ensures stability, heat and chemical resistance, and the main material of the plasma-resistant insulator (Gasket) is silicon/graphite, which is resistant to high temperature, corrosion, and thermal insulation.

Product use

It is used to optimise the whole environment in the vacuum chamber of the etching equipment, to ensure thermal conductivity, electrical conductivity, vacuum, and is the main component of the vacuum chamber.

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