Product
Yttrium oxide, aluminium oxide spray powder, ceramic powder
Classification:
Model
Powder raw materials for plasma coating of all parts in the etching process of semiconductor/LCD panels, and ceramic parts for vacuum cavities of semiconductor/LCD panels.
Direction of application
Surface coating of non-yttrium substrates for etching machine cavities; raw materials for ceramic substrate parts.
Product characteristics
Yttrium oxide spray powder, the original grain size concentrated in 80 nm, lattice stability does not absorb carbon, coating strength of 45 MPa or more, low intracrystalline void rate, lattice defects, high degree of crystallisation, lattice extension of the regular cycle of change in the excellent powder; in the field of fusion injection plasma spraying, yttrium oxide has a small size effect, it is very easy to melt in the instant sticking in the surface of the substrate, the formation of a uniformly strong bonding force; Yttrium oxide has good dispersion, narrow particle size distribution, high thermal stability, coating grains are not easy to grow, good mechanical properties between coating particles, strong resistance to external erosion; yttrium oxide, lattice integrity is not easy to form defects in the centre of the adsorption of impurities, the coating will not be reddened due to the body carbon absorption.
Product use
In the chip etching process, the good environment of the etching cavity plays a key role in the quality and cost of chip processing. Silicon composite yttrium oxide (Si-Y-O) is coated in the quartz substrate of the etching cavity, and aluminium composite yttrium oxide (YAG), YOF and YF3 are sprayed on the surface layer of alumina ceramics, which can withstand the erosion of the substrate by the high-fluorine environment and thermal radiation in the etching process.
